PCB Etching Equipment and Wet processing equipment and Chemical Milling machine and Metal etchers


PCB developing machine use Sodium carbonate development


PCB developing machine use Sodium carbonate development

PCB developing machine working video:

Features: PCB developing machine use Sodium carbonate development is used for PCB photoresist film developer work. auto spray imaging Machine.PCB Developing MACHINE, Double side film Developing Machine, auto spray imaging Machine

This machine has a cost-effective, oscillation system and affordable price

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Process flow: Load → developing → →washing1,2 →Unload

Main technical parameter:

Model:GE-D650W
Power: 10KW/380V
Working size: 650*L mm(L= length is not limited)
working height:850±10mm;
developing area length: 1000mm
Washing area lenght:1000mm
Working Temp.: RT~65℃
Tolerance: 0.05mm
Developing type: double side spray with oscllation system
Transfer type: PLT wheel
Outsize:2250*1100*1200mm (mm)
weight: 450kgs
Control System:
Speed Adjust system
Pressure Adjust System
Temperature control System(both Heater and cooler)
Network Filter System
High temperature (up to 100) resist PP material
Long time Etching Ability

This machine with high precision oscilation system 。

PCB developing machine use Sodium carbonate development,PCB Developing MACHINE,film Developing Machine,auto spray imaging Machine

Small film Developing MACHINE for PCB

Small film Developing MACHINE for PCB

  • Small film Developing MACHINE for PCB
  • Model Number: GE-S400D
  • Working size: W400mm*L (L= length is not limited)
  • developing area length: 500mm
  • Outsize: 1250*1100*1200mm
  • Machine process: Loading-Developing-Cleaning-Sponge drying-Unloading
  • PCB Developer Machine is used for PCB photoresist film developer work. auto spray imaging Machine.
Double Side Spray developing Machine

Double Side Spray developing Machine

  • Double Side Spray developing Machine
  • Model Number: GE-S650D
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2250*1280*1200mm
  • Machine process: Loading-Developing-Unloading
  • Double Side Spray developing Machine is used for metal plate and PCB photoresist film developer work. auto spray imaging Machine.
PCB developing machine use Sodium carbonate development

PCB developing machine

  • PCB developing machine use Sodium carbonate development
  • Model Number: GE-D650W
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Pump washing :500mm
  • city washing:500mm
  • Machine process: Load → Developing → water washing1,2 → squeeze → Unload
  • PCB developing machine use Sodium carbonate development ,with water washing
solder mask developing Machine

solder mask developing Machine

  • solder mask developing Machine with rinsing and drying
  • Model Number: GE-SRD650
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2850*1280*1200mm
  • Machine process: Load → Developing → water washing → squeeze→Air knife Drying → Unload
  • solder mask developing Machine with rinsing and drying used for PCB and other metal plate solder mask developing ,auto spray imaging Machine
Photoresist developing cleaning drying Machine

Photoresist developing Machine

  • Photoresist developing cleaning drying Machine
  • Model: GE-XY650
  • Working size: W650mm*L (L= length is not limited)
  • Machine process: Load → Developing → water washing → squeeze→cold & hot Drying → Unload
  • Machine dimension :8000*1700*1850mm
  • The Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.