PCB Etching Equipment and Wet processing equipment and Chemical Milling machine and Metal etchers


S650 Double Side Spray developing Machine


S650 Double Sided spray developing Machine

 

Features:This double spray developing machine is a chemical photoengraving processing equipments. It can do high-quality developing works of single developing or double sided developing .

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Process flow: Load → developing → Unload

Main technical parameter:

Model Number: GE-S650D

Power: 4.5KW/380V
Working size: 650*L mm(L= length is not limited)
developing area length: 1000mm
Working Temp.: 38~65℃
Tolerance: 0.05mm
Etching type: PLT sprayer
Transfer type: PLT wheel
Outsize: 2150*1350*1250mm
weight: 480kg
Control System:
Speed Adjust system
Pressure Adjust System
Temperature control System(both Heater and cooler)
Network Filter System
High temperature (up to 100) resist German PP material
Long time Etching Ability

Double Side Spray developing Machine, PCB developing machine

Small film Developing MACHINE for PCB

Small film Developing MACHINE for PCB

  • Small film Developing MACHINE for PCB
  • Model Number: GE-S400D
  • Working size: W400mm*L (L= length is not limited)
  • developing area length: 500mm
  • Outsize: 1250*1100*1200mm
  • Machine process: Loading-Developing-Cleaning-Sponge drying-Unloading
  • PCB Developer Machine is used for PCB photoresist film developer work. auto spray imaging Machine.
Double Side Spray developing Machine

Double Side Spray developing Machine

  • Double Side Spray developing Machine
  • Model Number: GE-S650D
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2250*1280*1200mm
  • Machine process: Loading-Developing-Unloading
  • Double Side Spray developing Machine is used for metal plate and PCB photoresist film developer work. auto spray imaging Machine.
solder mask developing Machine

solder mask developing Machine

  • solder mask developing Machine with rinsing and drying
  • Model Number: GE-SRD650
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2850*1280*1200mm
  • Machine process: Load → Developing → water washing → squeeze→Air knife Drying → Unload
  • solder mask developing Machine with rinsing and drying used for PCB and other metal plate solder mask developing ,auto spray imaging Machine
Photoresist developing cleaning drying Machine

Photoresist developing Machine

  • Photoresist developing cleaning drying Machine
  • Model: GE-XY650
  • Working size: W650mm*L (L= length is not limited)
  • Machine process: Load → Developing → water washing → squeeze→cold & hot Drying → Unload
  • Machine dimension :8000*1700*1850mm
  • The Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.