PCB Etching Equipment and Wet processing equipment and Chemical Milling machine and Metal etchers


Photoresist developing cleaning drying Machine


Photoresist developing cleaning drying Machine

Photoresist developing cleaning drying Machine Video

Features:Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.

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Process flow: Load → Developing1,2 → pressure water washing→ city water washing → squeeze→ Cold & Hot Dry → Unload

Main technical parameter:
Model:GE-XY650
Power:380V/50HZ/60HZ
Working width:650mm
Working height:850mm (+/50mm adjust)
Min / Max board size:120*80mm / 500*500mm
Develop type:Double Spray with Oscillate system
Workpiece thickness:0.2~3.2mm
Working Temperature:35~55 ℃
Conveyor Speed:0.5～6m/min
Heater/Cooling Pipe:Titanium Pipe
Machine dimension :8000*1700*1850mm
Automatic Control System:
Working Speed Adjust system
Pressure Adjust System
Temperature control System
High temperature (up to 100) resists German PP material

PCB Developing Washing Drying Line,PCB developing machine,developing machine

Small film Developing MACHINE for PCB

Small film Developing MACHINE for PCB

  • Small film Developing MACHINE for PCB
  • Model Number: GE-S400D
  • Working size: W400mm*L (L= length is not limited)
  • developing area length: 500mm
  • Outsize: 1250*1100*1200mm
  • Machine process: Loading-Developing-Cleaning-Sponge drying-Unloading
  • PCB Developer Machine is used for PCB photoresist film developer work. auto spray imaging Machine.
Double Side Spray developing Machine

Double Side Spray developing Machine

  • Double Side Spray developing Machine
  • Model Number: GE-S650D
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2250*1280*1200mm
  • Machine process: Loading-Developing-Unloading
  • Double Side Spray developing Machine is used for metal plate and PCB photoresist film developer work. auto spray imaging Machine.
PCB developing machine use Sodium carbonate development

PCB developing machine

  • PCB developing machine use Sodium carbonate development
  • Model Number: GE-D650W
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Pump washing :500mm
  • city washing:500mm
  • Machine process: Load → Developing → water washing1,2 → squeeze → Unload
  • PCB developing machine use Sodium carbonate development ,with water washing
solder mask developing Machine

solder mask developing Machine

  • solder mask developing Machine with rinsing and drying
  • Model Number: GE-SRD650
  • Working size: W650mm*L (L= length is not limited)
  • developing area length: 1000mm
  • Outsize: 2850*1280*1200mm
  • Machine process: Load → Developing → water washing → squeeze→Air knife Drying → Unload
  • solder mask developing Machine with rinsing and drying used for PCB and other metal plate solder mask developing ,auto spray imaging Machine
Photoresist developing cleaning drying Machine

Photoresist developing Machine

  • Photoresist developing cleaning drying Machine
  • Model: GE-XY650
  • Working size: W650mm*L (L= length is not limited)
  • Machine process: Load → Developing → water washing → squeeze→cold & hot Drying → Unload
  • Machine dimension :8000*1700*1850mm
  • The Photoresist developing cleaning drying Machine can be built for use with all common aqueous resists, including: dry film photoresists, liquid resists, and dry film and liquid solder mask resists.